Boron Nitride Electrode insulator for Ion Implanter
What is Boron Nitride? Hexagonal boron nitride (h-BN) ceramic has a microstructure similar to graphite. It is manufactured by hot pressing boron nitride powders at temperatures up to 2000 ° C and high pressure. The maximum blank size is 500 × 500 × 200 mm, and it can be further machined into complex shapes. Why Can Boron Nitride Ceramics Be Used in Ion Implanters? Ion implantation is a key process in semiconductor manufacturing, where wafers are doped with foreign atoms to modify material properties such as conductivity and crystal structure. The high-current extraction electrode is the core of an ion implanter system. It must withstand temperatures up to 1400 ° C, strong electromagnetic fields, aggressive process gases, and high mechanical forces. Therefore, components made from boron nitride insulator ceramics help ensure that this process remains efficient, precise, and free of impurities. The unique combination of exceptional the...