Alumina Ceramic Focus Rings
Alumina Ceramic Focus rings are designed to improve etch uniformity around the wafer edge or perimeter. When used with an electrostatic chuck (e-chuck), the wafer rests on the edge focus ring – held in place by the electrostatic charge. Alumina Ceramic Focus Rings serve as critical components within plasma etch equi pment, primarily in the etch chamber. The rings are strategically positioned to optimize plasma distribution and maintain uniformity during the etching process. Semiconductor manufacturing processes require operation within cleanroom environments, particularly for components used under high-temperature, vacuum, and corrosive gas conditions. Ceramic materials maintain high stability within these complex physical and chemical environments. The Ceramic Focus Ring is a critical part of the Semiconductor Etch Process. When aluminum alloy is chosen as the etch chamber material, it can easily cause metal particle contamination. Therefore, high-purity (over 99.5%) alumina ceramic ...